Materials Science
原子层化学气相沉积
Atomic Layer Chemical Vapor Deposition (ALCVD)A vapor-phase deposition technique used to deposit thin films by alternating the supply of reactive gases. / 气相沉积技术，通过交替供应反应气体来沉积薄膜。
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- 工艺技术
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- 农场主
- Last updated
- 2026-10-08 07:59:57
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1 recordsRecord title: Atomic Layer Chemical Vapor Deposition (ALCVD).
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