Materials Science
原子层沉积
Atomic Layer DepositionAtomic Layer Deposition (ALD) is a thin film deposition technique that uses sequential, self-limiting surface reactions to deposit materials layer by layer. / 原子层沉积是一种薄膜沉积技术，利用顺序、自限制的表面反应逐层沉积材料。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-10-12 16:01:19
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Main parameters and performance indicators
Precursor: Chemicals used to deposit material layersPurge: Gas used to remove excess precursorTemperature: Reaction temperature
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Related literature
ranked by community starsUltra-strong carbon fibers via atomic layer deposition-induced dual-scale defect regulationOpen source
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Creation and modification trail
1 recordsRecord title: Atomic Layer Deposition.
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