Materials Science
阴极圆柱等离子体沉积
Cathodic Cylinder Plasma DepositionA physical vapor deposition technique utilizing a cylindrical cathode to generate plasma, used for synthesizing multiphase semiconductor films. / 一种利用圆柱形阴极产生等离子体的物理气相沉积技术，用于合成多相半导体薄膜。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-10-31 21:05:48
Sub-knowledge points
Cu–Fe–Se Semiconductor FilmsOptoelectrical Properties
Higher-order knowledge points
Semiconductor FabricationThin Film Deposition
Main parameters and performance indicators
Deposition Temperature: Influences optoelectrical properties and film formationCathode Cylinder: Geometry of the plasma source
Open problems
No unresolved problem recorded yet
Related literature
ranked by community starsNovel synthesis of multiphase Cu–Fe–Se semiconductor films by cathodic cylinder plasma deposition: influence of deposition temperature on optoelectrical propertiesOpen source
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1 recordsRecord title: Cathodic Cylinder Plasma Deposition.
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