Materials Science
化学气相沉积
Chemical Vapor DepositionA method used to deposit thin films of materials onto a substrate by chemical reactions. / 一种通过化学反应在基底上沉积材料薄膜的方法。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-11 23:05:34
Sub-knowledge points
No connected node yet
Higher-order knowledge points
No connected node yet
Main parameters and performance indicators
Temperature: Critical for reaction kinetics and film qualityPressure: Influences gas-phase reactions and film morphologyPrecursor Gases: The source materials for the deposited film
Open problems
No unresolved problem recorded yet
Related literature
ranked by community starsA cvd-CME for direct in situ hydrogen sulfide sensing in vivoOpen source
Related products and links
No item recorded yet
Creation and modification trail
1 recordsRecord title: Chemical Vapor Deposition.
Node update feedback
review required