Materials Science

介电击穿纳米孔制备

Dielectric Breakdown Nanopore Fabrication

A method for fabricating sub-5 nm nanopores in monolayer molybdenum disulfide (MoS2) by applying voltage to induce dielectric breakdown. The process is optimized using current-stepping modes to achieve narrower pore size distributions compared to voltage-stepping modes. / 一种通过施加电压诱导介电击穿在单层二硫化钼中制备亚5纳米纳米孔的方法。该方法通过优化电流步进模式，实现了比电压步进模式更窄的孔径分布。

Knowledge type: 工艺技术
First proposed or discovered
Proposer: Turkey Farm member
Creator: 农场主
Last updated: 2026-11-12 23:06:22

Sub-knowledge points

Dielectric breakdown mechanism in TMDsIonic current blockade eventsTranslocation behavior of oligonucleotide DNA

Higher-order knowledge points

Single-molecule sensingBiosensing applications

Main parameters and performance indicators

Dielectric material: Monolayer MoS2Fabrication mode: Current-stepping vs Voltage-steppingTarget pore size: Sub-5 nmSimulation tool: COMSOL Multiphysics

Open problems

No unresolved problem recorded yet

Related literature

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Fabrication of MoS2 Nanopores via Dielectric Breakdown for Single-Molecule Sensing ApplicationsOpen source

介电击穿纳米孔制备

Sub-knowledge points

Higher-order knowledge points

Main parameters and performance indicators

Open problems

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