Materials Science
电场辅助沉积
Electric Field Assisted DepositionA deposition technique where an external electric field is applied during the growth of thin films to modify the film's properties. / 一种在薄膜生长过程中施加外部电场以改变薄膜性质的沉积技术。
- Knowledge type
- 工艺技术
- First proposed or discovered
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- Turkey Farm member
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- 农场主
- Last updated
- 2026-11-08 20:06:40
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Main parameters and performance indicators
Electric Field Strength: Applied voltage or field intensity during depositionDeposition Method: Plasma Enhanced Chemical Vapor Deposition (PECVD)
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Related literature
ranked by community starsDramatic reduction of trap-assisted recombination in PECVD-grown Ge1-xSnx films by applying an electric field during depositionOpen source
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1 recordsRecord title: Electric Field Assisted Deposition.
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