Materials Chemistry and Physics
电化学原子层沉积
Electrochemical atomic layer depositionA thin film growth technique that uses alternating electrochemical reactions to deposit materials with precise atomic-level control. / 一种利用交替电化学反应沉积材料以实现原子级精确控制的薄膜生长技术。
- Knowledge type
- 工艺技术
- First proposed or discovered
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- Turkey Farm member
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- 农场主
- Last updated
- 2026-11-07 17:05:39
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Main parameters and performance indicators
Deposition material: Co(Cu) thin filmsProcess: Electrochemical atomic layer depositionApplication: Advanced interconnects
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Related literature
ranked by community starsElectrochemical atomic layer deposition of Co(Cu) thin films with controlled doping for advanced interconnectsOpen source
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1 recordsRecord title: Electrochemical atomic layer deposition.
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