Materials Science
电子束直写
Electron-beam direct writingA lithographic technique that uses a focused beam of electrons to directly write patterns onto a resist-coated substrate. / 电子束直写是一种利用聚焦电子束在涂有抗蚀剂的基底上直接写入图案的微纳加工技术。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-10-08 08:05:50
Sub-knowledge points
Direct patterning capabilityHigh resolution sub-10 nm featuresMaskless fabrication process
Higher-order knowledge points
Main parameters and performance indicators
Electron beam energy: Determines penetration depth and resolutionBeam current: Controls writing speed and exposure doseScanning speed: Affects line edge roughness and throughput
Open problems
Throughput limitations compared to optical lithographyCharging effects on insulating substratesHigh equipment cost and complexity
Related literature
ranked by community starsElectron-beam direct writing-based fabrication of high-performance carbon-based dielectrics towards all-carbon electronicsOpen source
Related products and links
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Creation and modification trail
1 recordsRecord title: Electron-beam direct writing.
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