Materials Science
氧化钬薄膜
Hafnium Dioxide (HfO2) Thin FilmsHfO2 is a high-k dielectric material widely used in microelectronics and optical coatings. / HfO2是一种高介电常数材料，广泛用于微电子学和光学涂层。
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- 物理设备
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- 农场主
- Last updated
- 2026-10-28 23:02:07
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Main parameters and performance indicators
Material: Hafnium Dioxide (HfO2)Deposition Method: Electron-beam evaporationFilm Thickness: DependentApplication: Optical films
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ranked by community starsThickness-dependent friction characteristics and surface damage of electron-beam-evaporated HfO2 optical films in ball-on-disk contactsOpen source
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1 recordsRecord title: Hafnium Dioxide (HfO2) Thin Films.
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