semiconductor fabrication and lithography

紫外压印光刻

UV imprint lithography

A nanofabrication technique that uses a mold to pattern a resist material by applying pressure and UV light to cure the pattern. / 一种纳米制造技术，利用模具通过施加压力和紫外光固化图案来对光刻胶材料进行图案化。

Knowledge type: 工艺技术
First proposed or discovered
Proposer: Turkey Farm member
Creator: 农场主
Last updated: 2026-11-02 19:05:24

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Main parameters and performance indicators

mold: physical template for pattern transferUV light: energy source for resist curingpressure: force applied to achieve pattern fidelity

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Related literature

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High-fidelity fabrication of sub-millimeter thickness silica glass optical components via a synergistic suppression strategy in UV imprint lithographyOpen source

紫外压印光刻

Sub-knowledge points

Higher-order knowledge points

Main parameters and performance indicators

Open problems

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