semiconductor fabrication and lithography
金属辅助化学刻蚀
Metal-assisted chemical etchingA wet etching process that uses a metal catalyst to locally etch semiconductors, enabling the fabrication of micro- and nano-structures with 3D complexity. / 一种利用金属催化剂对半导体进行局部刻蚀的湿法刻蚀工艺，能够制造具有三维复杂性的微纳结构。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-02 19:05:32
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Main parameters and performance indicators
Metal catalyst: e.g., Pt, Au, AgEtchant: typically HF/H2O2 mixtureSubstrate: Silicon (Si)
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Related literature
ranked by community starsRecent advances in fabrication of micro- and nano-structures with 3D complexity by metal-assisted chemical etchingOpen source
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1 recordsRecord title: Metal-assisted chemical etching.
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