semiconductor fabrication and lithography
磁流变抛光
Magnetorheological PolishingA finishing process that utilizes a magnetorheological fluid (MRF) to remove material from a workpiece. The fluid becomes solid-like under a magnetic field, forming a flexible polishing pad that conforms to the surface topography. / 一种利用磁流变液在磁场作用下变硬形成柔性抛光垫的表面加工工艺。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-05 16:06:17
Sub-knowledge points
Structure–property relationship of the polishing padMagnetorheological polishing mechanism
Higher-order knowledge points
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Main parameters and performance indicators
Magnetorheological fluid: A smart fluid containing magnetic particles suspended in a carrier fluidMagnetic field: Generates the yield stress required for material removalPad stiffness: Controlled by the magnetic field strength to adjust material removal rate
Open problems
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Related literature
ranked by community starsStructure–property relationship of a magnetorheological elastomer polishing pad for single-crystal SiC and its magnetorheological polishing mechanismOpen source
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Creation and modification trail
1 recordsRecord title: Magnetorheological Polishing.
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