Materials Science
无掩模剥离微加工
Maskless lift-off microfabricationA microfabrication technique utilizing direct femtosecond-laser patterning of PMMA resist to create lift-off structures without the need for a physical photomask. / 一种利用飞秒激光直接对PMMA抗蚀剂进行图案化以制造剥离结构，从而无需物理光掩模的微加工技术。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-12 16:05:39
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Main parameters and performance indicators
PMMA resist: Polymethyl methacrylate used as the photoresistFemtosecond-laser: High-precision laser source for direct patterning
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Related literature
ranked by community starsMaskless lift-off microfabrication via direct femtosecond-laser patterning of PMMA resistOpen source
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1 recordsRecord title: Maskless lift-off microfabrication.
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