semiconductor fabrication
刻蚀邻近效应校正
Etch Proximity CorrectionA correction method used in semiconductor manufacturing to compensate for the non-uniformity of etching rates caused by the proximity of features on a wafer. / 一种用于补偿晶圆上特征邻近导致刻蚀速率不均匀性的校正方法。
- Knowledge type
- 工艺技术
- First proposed or discovered
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- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-14 21:05:19
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Main parameters and performance indicators
Correction Model: Transformer-Based OptimizationTarget: Lithography and Etch Process
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Related literature
ranked by community starsDifferentiable Etch Proximity Correction With Transformer-Based OptimizationOpen source
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1 recordsRecord title: Etch Proximity Correction.
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