Materials Science
高功率脉冲磁控溅射
High Power Impulse Magnetron SputteringA physical vapor deposition (PVD) technique that uses high-power pulses to generate high plasma densities, enabling the deposition of dense, hard coatings with low impurity levels. / 一种利用高功率脉冲产生高等离子体密度的物理气相沉积（PVD）技术，能够沉积致密、硬质且低杂质含量的涂层。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-08 16:05:30
Sub-knowledge points
Multilayer coating compositionsTarget erosion mechanismsCoating adhesion and hardness
Higher-order knowledge points
Physical Vapor DepositionThin Film TechnologySurface Engineering
Main parameters and performance indicators
Pulse Duration: Controls the energy delivered to the targetPulse Frequency: Determines the deposition ratePeak Power: Influences plasma density and coating properties
Open problems
No unresolved problem recorded yet
Related literature
ranked by community starsComparative study of HiPIMS multilayer coating compositions for enhanced cutting tool performanceOpen source
Related products and links
Multilayer coatingsRefractory metal coatingsHard coatings
Creation and modification trail
1 recordsRecord title: High Power Impulse Magnetron Sputtering.
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