semiconductor fabrication and lithography
逆向光刻
Inverse LithographyA computational process used in semiconductor manufacturing to optimize the mask layout for a given lithography system and process conditions, ensuring the printed pattern meets the design specifications. / 一种用于优化半导体制造中掩模布局的计算过程，确保打印图案满足设计规范。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-04 17:07:01
Sub-knowledge points
Mask OptimizationPattern TransferResolution Enhancement Techniques
Higher-order knowledge points
Semiconductor ManufacturingPhotolithography
Main parameters and performance indicators
Mask Layout: The target pattern to be printedLithography System: The optical system parameters (e.g., NA, wavelength)Process Conditions: Resist parameters and exposure dose
Open problems
Computational ComplexityModeling of Process Variations
Related literature
ranked by community starsEfficient angle-aware differentiable Mask3D modeling for inverse lithographyOpen source
Related products and links
No item recorded yet
Creation and modification trail
1 recordsRecord title: Inverse Lithography.
Node update feedback
review required