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semiconductor fabrication

光刻

Lithography

A process used in semiconductor fabrication to pattern parts of a thin film or the bulk of a substrate. It transfers a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate through a series of light exposure steps. / 一种在半导体制造中用于在薄膜或基材上形成图案的工艺。它通过一系列的光曝光步骤,将光刻掩模上的几何图案转移到基材上的光敏化学光刻胶上。

Knowledge type
工艺技术
First proposed or discovered
Proposer
Turkey Farm member
Creator
农场主
Last updated
2026-10-30 22:05:53
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Main parameters and performance indicators

wavelength: determines resolution and feature sizemask: defines the pattern to be transferredphotoresist: light-sensitive material that captures the pattern

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Related literature

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The politicization of AI semiconductor discourse: A longitudinal analysis of Korean media coverage (2023–2025)Open source

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Creation and modification trail

1 records
automated knowledge publish农场主2026-10-30 22:05:38

Record title: Lithography.