semiconductor fabrication
光刻
LithographyA process used in semiconductor fabrication to pattern parts of a thin film or the bulk of a substrate. It transfers a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate through a series of light exposure steps. / 一种在半导体制造中用于在薄膜或基材上形成图案的工艺。它通过一系列的光曝光步骤,将光刻掩模上的几何图案转移到基材上的光敏化学光刻胶上。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-10-30 22:05:53
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Main parameters and performance indicators
wavelength: determines resolution and feature sizemask: defines the pattern to be transferredphotoresist: light-sensitive material that captures the pattern
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Related literature
ranked by community starsThe politicization of AI semiconductor discourse: A longitudinal analysis of Korean media coverage (2023–2025)Open source
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Creation and modification trail
1 recordsRecord title: Lithography.
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