semiconductor fabrication and lithography
光学邻近效应修正
Optical Proximity CorrectionA method used in photolithography to compensate for optical distortions caused by diffraction and interference, ensuring that printed patterns match the intended design. / 光刻工艺中用于补偿由衍射和干涉引起的光学畸变的方法，确保打印图案与预期设计一致。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-04 17:05:41
Sub-knowledge points
Line-end shorteningCorner roundingLocal linewidth variation
Higher-order knowledge points
Plasmonic lithographyMask pattern optimization
Main parameters and performance indicators
Edge Placement Error (EPE): The deviation between the designed edge position and the actual edge position.Correction Coefficient: An adaptive value that controls the movement distance of edges based on overall EPE.
Open problems
No unresolved problem recorded yet
Related literature
ranked by community starsPlasmonic lithography optical proximity correction method based on a decomposed machine-learning fast imaging modelOpen source
Related products and links
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Creation and modification trail
1 recordsRecord title: Optical Proximity Correction.
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