Materials Science in Semiconductor Processing
选择性化学湿法刻蚀
Selective chemical wet etchingA microfabrication process used to remove specific regions of a material, such as B-doped Si0.8Ge0.2 epitaxial layers, by immersing the substrate in a chemical solution. / 一种微加工工艺，通过将基板浸入化学溶液中来去除特定区域的材料，例如硼掺杂的Si0.8Ge0.2外延层。
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- 2026-10-30 22:05:45
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ranked by community starsSelective chemical wet etching of B-doped Si0.8Ge0.2 epitaxial layers for multistacked memory devicesOpen source
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1 recordsRecord title: Selective chemical wet etching.
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