semiconductor fabrication and lithography
紫外压印光刻
UV imprint lithographyA nanofabrication technique that uses a mold to pattern a resist material by applying pressure and UV light to cure the pattern. / 一种纳米制造技术，利用模具通过施加压力和紫外光固化图案来对光刻胶材料进行图案化。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-02 19:05:24
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Main parameters and performance indicators
mold: physical template for pattern transferUV light: energy source for resist curingpressure: force applied to achieve pattern fidelity
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Related literature
ranked by community starsHigh-fidelity fabrication of sub-millimeter thickness silica glass optical components via a synergistic suppression strategy in UV imprint lithographyOpen source
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1 recordsRecord title: UV imprint lithography.
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