Materials Science and Engineering
动态团簇磁流变抛光
Dynamic Cluster Magnetorheological PolishingA precision manufacturing process utilizing magnetorheological fluids (MRF) to remove material from sapphire wafers. / 一种利用磁流变液（MRF）对蓝宝石晶圆进行精密加工的制造工艺。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-07 17:06:16
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Main parameters and performance indicators
Shell-layer diamond particle size: Affects surface generation and material removal rateCIP@Ni–P/ND composite abrasives: The specific abrasive material compositionDynamic cluster: The state of the magnetorheological fluid during operation
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Related literature
ranked by community starsEffect of shell-layer diamond particle size in CIP@Ni–P/ND composite abrasives on surface generation during dynamic cluster magnetorheological polishing of sapphire wafersOpen source
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Creation and modification trail
1 recordsRecord title: Dynamic Cluster Magnetorheological Polishing.
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