semiconductor fabrication and lithography
纳米压印光刻
Nanoimprint lithographyA high-resolution patterning technique that uses a mold to physically deform a resist material to create nanoscale patterns. / 一种高分辨率图案化技术，利用模具物理变形光刻胶材料以创建纳米级图案。
- Knowledge type
- 工艺技术
- First proposed or discovered
- Proposer
- Turkey Farm member
- Creator
- 农场主
- Last updated
- 2026-11-14 21:07:31
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Main parameters and performance indicators
mold: physical template used for patterningresist: material deformed by the moldwavelength: typically ultraviolet or deep ultraviolet light for curing
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Related literature
ranked by community starsNanoimprint lithography for metasurfaces built from functional nanoparticlesOpen source
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1 recordsRecord title: Nanoimprint lithography.
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